Q152
Why is silicon dioxide (SiO2) layer used in ICs?
A.
To protect the surface of the chip from external contaminants and to allow for selective formation of the n and p regions by diffusion
AnswerB.
because it facilitates the penetration of the desired impurity by diffusion
C.
To control the concentration of the diffused impurities by diffusion
D.
Because of its high heat conduction
Answer: Option A
Solution
Answer: Option A
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